The system is capable of writing nano-scale structures at high speed directly on to the surface of a resist coated substrate (examples of typical substrates include semiconductor wafers or glass). The substrates are rotated in normal air condition. Compared to conventional lithography systems the NEO-500 has advantages of compact size and low investment costs without comprising performance, according to Pulstec. These advantages are achieved by using a visible semiconductor laser as a light source and Pulstec's uniquely designed optics.
The system can create continuous or periodic nano dot patterns and nano-scale grating. Application examples include optical filters, antireflective structures, photonic crystals, nano-imprint molding and biotechnology.
Held in Feb. 17 - Feb. 19 at Tokyo Big Sight, Japan, the nano tech 2010 International Nanotechnology Exhibition & Conference is the world's largest nanotechnology exhibition.