ASML 3400B Production Platform For EUVL Ready For Shipping
At the SPIE Advanced Lithography conference, ASML announced the NXE:3400B, the extreme ultraviolet lithography scanner that it hopes makes it into volume-production fabs....
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At the SPIE Advanced Lithography conference, ASML announced the NXE:3400B, the extreme ultraviolet lithography scanner that it hopes makes it into volume-production fabs....
SPIE's 2017 Advanced Lithography Conference kicked off in San Jose, California and respesentatives from Intel and Samsung said that Extreme ultraviolet (EUV is making...
TSMC and IBM has presented separate papers at the International Electron Devices Meeting (IEDM), describing their respective results nudging forward both Moore's law and...