Saturday, October 10, 2015
Submit your own News for
inclusion in our Site.
Click here...
Breaking News
3Q15 Hard Disk Drive Shipments Report
Japanese Fund may Invest In Sharp: report
ASUS Upgrades Its ROG Gaming Lineup
ITC Says Samsung Did Not infringe Nvidia's Patents
ARCHOS and Sikur Ensure Your Privacy with GranitePhone
Firefox To Switch Away From Plugins
Apple Removes Apps From Online Store
PC Shipments Kept Falling In 3Q
Active Discussions
How to back up a PS2 DL game
Copy a protected DVD?
roxio issues with xp pro
How to burn a backup copy of The Frozen Throne
Help make DVDInfoPro better with dvdinfomantis!!!
Copied dvd's say blank in computer only
menu making
Optiarc AD-7260S review
 Home > News > General Computing > Semicon...
Last 7 Days News : SU MO TU WE TH FR SA All News

Thursday, July 14, 2011
Semiconductor Firms and SEMATECH to Develop Metrology Tools for Extreme Ultraviolet Lithography Masks

GLOBALFOUNDRIES, Intel, TSMC, and Samsung Electronics have joined SEMATECH's EMI partnership to build metrology devices for detecting defects in advanced masks suitable for extreme ultraviolet lithography (EUVL).

The semiconductor firms hope to manufacture defect-free EUVL in bulk volumes.

In 2010, SEMATECH introduced EMI to target crucial infrastructure limitations for EUV related to mask metrology, by providing financial support for the development of key metrology equipment. Carl Zeiss and SEMATECH have collaborated to develop and manufacture the first actinic aerial image metrology (AIMS) EUV system in the industry, which was specifically designed for EUVL bulk production.

The AIMS EUV platform is a crucial device to design and produce defect-free EUVL masks that meets the requirements of the 22 nm half-pitch (HP) technology node and the 16 nm HP node. The platform will be ready for production in the middle of 2014.

VP of Advanced Technologies, SEMATECH, John Warlaumont, stated that the AIMS system is the largest project ever undertaken by the company for developing semiconductor photomask detection equipment and aims at commercializing EUV for bulk manufacturing.

EMI is available to mask blank suppliers, mask and chip-manufacturers, regional governments, and other consortia.

Spotify Music Service Launches In The US        All News        DECE Begins Licensing Of UltraViolet DRM Program
Spotify Music Service Launches In The US     General Computing News      DECE Begins Licensing Of UltraViolet DRM Program

Get RSS feed Easy Print E-Mail this Message

Related News
ITC Says Samsung Did Not infringe Nvidia's Patents
18.4-inch Samsung Galaxy View Tablet Passes FCC Certification
Samsung Says Pay is Safe, Following Hack Attempt
Samsung 3Q Operating Profit Surges
Globalfoundries Said To Move To 10nm Development On Its Own
Samsung To Use Snapdragon 820 Chips In Some Galaxy S7 Phones: report
Samsung Rejects Press Claim On TV Compliance Testing
Samsung Expands Radiant360 Speaker Series
Samsung SE370 Is The First Wireless Charging Monitor
Samsung Gear S2 Coming In the U.S. October 2
Samsung Pay Launches In The U.S.
New Firmware For Intel 750 Series SSD MAkes Your PC Booy Up Faster

Most Popular News
Home | News | All News | Reviews | Articles | Guides | Download | Expert Area | Forum | Site Info
Site best viewed at 1024x768+ - CDRINFO.COM 1998-2015 - All rights reserved -
Privacy policy - Contact Us .