Sunday, August 02, 2015
Search
  
Submit your own News for
inclusion in our Site.
Click here...
Breaking News
Microsoft Sees Growth Beyond The Desktop With Windows 10
Yahoo Gets Fashionable With Acquisition Of Polyvore
NVIDIA Recalls SHIELD Tablets Due To Battery Issues
Firefox Attacks Microsoft Over Default Browser in Windows 10
Sharp to Exit Americas TV Market
Researchers Showcase Javascript-based Attack On a Computer's DRAM
Hackers Used Twitter hashtags To Extract Data From Compromised Networks
Facebook Unveils New Security Checkup Tool
Active Discussions
How to back up a PS2 DL game
Copy a protected DVD?
roxio issues with xp pro
How to burn a backup copy of The Frozen Throne
Help make DVDInfoPro better with dvdinfomantis!!!
Copied dvd's say blank in computer only
menu making
Optiarc AD-7260S review
 Home > News > General Computing > Semicon...
Last 7 Days News : SU MO TU WE TH FR SA All News

Thursday, July 14, 2011
Semiconductor Firms and SEMATECH to Develop Metrology Tools for Extreme Ultraviolet Lithography Masks


GLOBALFOUNDRIES, Intel, TSMC, and Samsung Electronics have joined SEMATECH's EMI partnership to build metrology devices for detecting defects in advanced masks suitable for extreme ultraviolet lithography (EUVL).

The semiconductor firms hope to manufacture defect-free EUVL in bulk volumes.

In 2010, SEMATECH introduced EMI to target crucial infrastructure limitations for EUV related to mask metrology, by providing financial support for the development of key metrology equipment. Carl Zeiss and SEMATECH have collaborated to develop and manufacture the first actinic aerial image metrology (AIMS) EUV system in the industry, which was specifically designed for EUVL bulk production.

The AIMS EUV platform is a crucial device to design and produce defect-free EUVL masks that meets the requirements of the 22 nm half-pitch (HP) technology node and the 16 nm HP node. The platform will be ready for production in the middle of 2014.

VP of Advanced Technologies, SEMATECH, John Warlaumont, stated that the AIMS system is the largest project ever undertaken by the company for developing semiconductor photomask detection equipment and aims at commercializing EUV for bulk manufacturing.

EMI is available to mask blank suppliers, mask and chip-manufacturers, regional governments, and other consortia.


Previous
Next
Spotify Music Service Launches In The US        All News        DECE Begins Licensing Of UltraViolet DRM Program
Spotify Music Service Launches In The US     General Computing News      DECE Begins Licensing Of UltraViolet DRM Program

Get RSS feed Easy Print E-Mail this Message

Related News
Galaxy S6 Sales Not Enough To Keep Samsung's Profit High
Intel Releases 3rd Gen Wireless-AC 8260 for Windows 10
Samsung Starts Mass Production Of First Mobile Image Sensor with 1.0µm Pixels
Samsung To Showcase New Galaxy Phablet on August 13 Event
Intel Skylake Processors To Provide Significant Graphics Boost
Smartphone Market Posts Year-Over-Year Growth in Q2 2015
Intel And Rackspace To Promote The Benefits of the Cloud Through New Initiative
Samsung Unveils New Data Center Solid State Drives
New Galaxy J2 Coming In S. Korea
Samsung Galaxy Tab S2 Tablet Coming Next Month
Intel Hits Q2 Financial Target, Pushes Back Transition to 10nm
Samsung Launches The Ultra-slim Galaxy A8 in China

Most Popular News
 
Home | News | All News | Reviews | Articles | Guides | Download | Expert Area | Forum | Site Info
Site best viewed at 1024x768+ - CDRINFO.COM 1998-2015 - All rights reserved -
Privacy policy - Contact Us .