Wednesday, November 25, 2015
Submit your own News for
inclusion in our Site.
Click here...
Breaking News
Panasonic's CX Ultra HD Smart TVs Bring 4K Closer To Home
New LG Ray Smartphone Focuses On Photo Shooting
HP Profit Lower Than Expected
Police Arrests Fifth Suspect In TalkTalk Hack Investigation
Toshiba Develops Fast 3D Metal Printer
ECS LIVA X2 Mini PC Runs Windows 10
Memory-Tech Ready To Start Mass Production Of UHD Blu-ray Disc
New Nokia 230 and Nokia 230 Dual SIM Phones Coming Next Month
Active Discussions
roxio issues with xp pro
How to back up a PS2 DL game
Copy a protected DVD?
How to burn a backup copy of The Frozen Throne
Help make DVDInfoPro better with dvdinfomantis!!!
Copied dvd's say blank in computer only
menu making
Optiarc AD-7260S review
 Home > News > General Computing > Semicon...
Last 7 Days News : SU MO TU WE TH FR SA All News

Thursday, July 14, 2011
Semiconductor Firms and SEMATECH to Develop Metrology Tools for Extreme Ultraviolet Lithography Masks

GLOBALFOUNDRIES, Intel, TSMC, and Samsung Electronics have joined SEMATECH's EMI partnership to build metrology devices for detecting defects in advanced masks suitable for extreme ultraviolet lithography (EUVL).

The semiconductor firms hope to manufacture defect-free EUVL in bulk volumes.

In 2010, SEMATECH introduced EMI to target crucial infrastructure limitations for EUV related to mask metrology, by providing financial support for the development of key metrology equipment. Carl Zeiss and SEMATECH have collaborated to develop and manufacture the first actinic aerial image metrology (AIMS) EUV system in the industry, which was specifically designed for EUVL bulk production.

The AIMS EUV platform is a crucial device to design and produce defect-free EUVL masks that meets the requirements of the 22 nm half-pitch (HP) technology node and the 16 nm HP node. The platform will be ready for production in the middle of 2014.

VP of Advanced Technologies, SEMATECH, John Warlaumont, stated that the AIMS system is the largest project ever undertaken by the company for developing semiconductor photomask detection equipment and aims at commercializing EUV for bulk manufacturing.

EMI is available to mask blank suppliers, mask and chip-manufacturers, regional governments, and other consortia.

Spotify Music Service Launches In The US        All News        DECE Begins Licensing Of UltraViolet DRM Program
Spotify Music Service Launches In The US     General Computing News      DECE Begins Licensing Of UltraViolet DRM Program

Get RSS feed Easy Print E-Mail this Message

Related News
Samsung Pay Adds Eight More Credit and Debit Card Issuers
UK High Court Rules Samsung and Huawei Infringe LTE Patent
Samsung Display Is Seeking OLED Growth Through Apple Deal
Intel Optane Memory Products Coming Next Year
Samsung To Release Bio Processor Next Year
Intel Advances High Performance Computing System Designs
Samsung Officially Unveils The Exynos 8 Octa Application Processor
GLOBALFOUNDRIES Launches High-Performance ASIC Offering on 14nm FinFET Process
Intel Expands The Xeon processor D-1500 Product Family And Unveils New Ethernet Controllers
Google Open Sources TensorFlow Machine Learning System
Samsung Prepares For Entry In Auto Technology
Samsung Electronics Takes The Lead in Smartphone Sales Worldwide

Most Popular News
Home | News | All News | Reviews | Articles | Guides | Download | Expert Area | Forum | Site Info
Site best viewed at 1024x768+ - CDRINFO.COM 1998-2015 - All rights reserved -
Privacy policy - Contact Us .