Thursday, December 18, 2014
Search
  
Submit your own News for
inclusion in our Site.
Click here...
Breaking News
ICANN Targeted in Phishing Attack
BlackBerry Classic Makes Official Debut
LG, Samsung, To Dominate The TV Market in 2015
Renesas Develops 16nm FinFET SRAM
Sony Film Debut Canceled After Threats
New Nintendo Devices To Use 'free-form' LCDs
Sony Single-Lens OLED Display Module Turns Any Eyewear Into Smartglasses
Dutch Privacy Watchdog Probes Facebook
Active Discussions
Windows xp
Will there be any trade in scheme for the coming PSP Go?
Hello, Glad to be Aboard!!!
Best optical drive for ripping CD's? My LG 4163B is mediocre.
Hi All!
cdrw trouble
CDR for car Sat Nav
DVD/DL for Optiarc 7191S at 8X
 Home > News > General Computing > Semicon...
Last 7 Days News : SU MO TU WE TH FR SA All News

Thursday, July 14, 2011
Semiconductor Firms and SEMATECH to Develop Metrology Tools for Extreme Ultraviolet Lithography Masks


GLOBALFOUNDRIES, Intel, TSMC, and Samsung Electronics have joined SEMATECH's EMI partnership to build metrology devices for detecting defects in advanced masks suitable for extreme ultraviolet lithography (EUVL).

The semiconductor firms hope to manufacture defect-free EUVL in bulk volumes.

In 2010, SEMATECH introduced EMI to target crucial infrastructure limitations for EUV related to mask metrology, by providing financial support for the development of key metrology equipment. Carl Zeiss and SEMATECH have collaborated to develop and manufacture the first actinic aerial image metrology (AIMS) EUV system in the industry, which was specifically designed for EUVL bulk production.

The AIMS EUV platform is a crucial device to design and produce defect-free EUVL masks that meets the requirements of the 22 nm half-pitch (HP) technology node and the 16 nm HP node. The platform will be ready for production in the middle of 2014.

VP of Advanced Technologies, SEMATECH, John Warlaumont, stated that the AIMS system is the largest project ever undertaken by the company for developing semiconductor photomask detection equipment and aims at commercializing EUV for bulk manufacturing.

EMI is available to mask blank suppliers, mask and chip-manufacturers, regional governments, and other consortia.


Previous
Next
Spotify Music Service Launches In The US        All News        DECE Begins Licensing Of UltraViolet DRM Program
Spotify Music Service Launches In The US     General Computing News      DECE Begins Licensing Of UltraViolet DRM Program

Get RSS feed Easy Print E-Mail this Message

Related News
LG, Samsung, To Dominate The TV Market in 2015
TSMC Chairman Sees Technical Hurdles In keeping Up With Moore's Law
Samsung Started Production of Apple A9 SoC in 14nm FinFET
Samsung Announces Annual Reorganization for 2015
Intel Unifies and Simplifies Connectivity for IoT
Samsung Releases New 3-bit V-NAND 850 EVO SSD
Possible Samsung Galaxy S6 Specs Leak
TSMC To Make Intel's SoFIA Handset Chips
Samsung Seeks to Toss $930 Million Award
Intel to Invest in China Factory
Intel and Luxottica To Collaborate On Smart Eyewear
Intel Offers Professor Stephen Hawking Ability to Better Communicate

Most Popular News
 
Home | News | All News | Reviews | Articles | Guides | Download | Expert Area | Forum | Site Info
Site best viewed at 1024x768+ - CDRINFO.COM 1998-2014 - All rights reserved -
Privacy policy - Contact Us .