Wednesday, June 03, 2015
Search
  
Submit your own News for
inclusion in our Site.
Click here...
Breaking News
Microsoft Showcases new Windows 10 Devices At Computex 2015
Corning's new Eagle XG Slim glass In Just 0.4mm Thick
Plextor At Computex 2015
Samsung Mobile Payment System Coming In September
Toshiba Partners with Microsoft to Deliver New Internet of Things Solutions
Kingston Releases USB Type-C Flash Drive
AMD Targets Notebooks and All-in-Ones With 6th Generation A-Series Processor
Computex: Micron Announces New High-Capacity, 16nm Triple-Level-Cell NAND
Active Discussions
Copy a protected DVD?
roxio issues with xp pro
How to burn a backup copy of The Frozen Throne
Help make DVDInfoPro better with dvdinfomantis!!!
Copied dvd's say blank in computer only
menu making
Optiarc AD-7260S review
cdrw trouble
 Home > News > PC Parts > Sony an...
Last 7 Days News : SU MO TU WE TH FR SA All News

Wednesday, December 07, 2005
Sony and Toshiba Develop Technologies for Enhanced 45nm Generation System LSI


Toshiba and Sony today announced the development of essential technologies for system LSI based on next-generation 45-nanometer process technology.

The advances cover the development of carrier mobility enhancement technologies and wiring process technology for boosting LSI performance.

Toshiba and Sony have raised current drive performance in transistors by developing strained silicon technologies that enhance carrier mobility. They have also developed a performance-enhancing low dielectric constant (low-k) film technology for implementation between layers in multi-layer wiring.

Two advances in strained silicon technologies improve individual transistor performance and overall device performance. The first optimizes the thickness of a stress liner covering the transistor and improves current drive performance by approximately 40%. The second brings global stress into the device substrate in a low cost process that realizes an approximately 20% improvement of current drive performance.

In seeking improved low-k film technology, Toshiba and Sony enhanced the quality of the low-k film by appropriately allocating dummy wiring to improve removal of moisture from the film. In doing so, they overcame the problem of poor drain characteristics in low-k film.

In 45nm generation system LSI, miniaturization of circuitry is no guarantee of performance improvement. Miniaturization must be accompanied by performance enhancement technologies, including utilization of new materials and structures. In following this approach, Toshiba and Sony have clarified conditions for applying innovative support technologies to actual products.

Toshiba and Sony announced details of the technologies at the International Electron Devices Meeting (IEDM), which runs in Washington D.C. from December 5 to December 7.

For more information read the official press release.


Previous
Next
New Rechargeable Battery Charges in 30 Seconds        All News        Kano to Distribute Ricoh's Encryption CD-R Media in North America
AMD And IBM Unveil 65nm Process Technologies     PC Parts News      Carbon Nanotube Heatsinks by Fujitsu

Get RSS feed Easy Print E-Mail this Message

Related News
Toshiba Partners with Microsoft to Deliver New Internet of Things Solutions
Sony Delivers New Entry-level Professional Camcorder, New 4K Laser Projection Options And Professional Laser and Lamp Projectors
Sony to Acquire Optical Archive As It Enters The Data Center Storage Market
Sony Aims At Growth Phase on Games, Image Sensors
Sony to License Its LDAC Audio Technology
Toshiba Demonstrates Object Storage Technologies
Optical Drive Makers Face EU Antitrust Fines
Sony launches New Xperia C4 and Xperia C4 Dual Smartphones
Camera Sensor And Playstation Sales Kepts Sony's Annual Profit High
Toshiba Launches Application Processor Development Platforms for Wearable and IoT Devices
Toshiba Starts Mass Production of 13 Megapixel CMOS Image Sensor
Sony Raises Profit Forecast

Most Popular News
 
Home | News | All News | Reviews | Articles | Guides | Download | Expert Area | Forum | Site Info
Site best viewed at 1024x768+ - CDRINFO.COM 1998-2015 - All rights reserved -
Privacy policy - Contact Us .