Altera and TSMC Collaborate on 55nm EmbFlash Process
Altera and TSMC today announced a technology collaboration using TSMC?s 55nm Embedded Flash (EmbFlash) process technology.
Programmable devices based on TSMC's 55nm EmbFlash target a wide range of low-power, high-volume applications in a variety of markets, including automotive and industrial.
Compared to prior generation embedded flash, TSMC's 55nm EmbFlash delivers faster computing, increases gate density 10 times, and shrinks flash and SRAM cell sizes by 70 percent and 80 percent respectively. Programmable devices from Altera based on TSMC's 55nm EmbFlash will allow developers of high-volume applications to build feature-rich, non-volatile systems.
Compared to prior generation embedded flash, TSMC's 55nm EmbFlash delivers faster computing, increases gate density 10 times, and shrinks flash and SRAM cell sizes by 70 percent and 80 percent respectively. Programmable devices from Altera based on TSMC's 55nm EmbFlash will allow developers of high-volume applications to build feature-rich, non-volatile systems.
