HamaTech Advanced Process Equipment, a SINGULUS TECHNOLOGIES company, today announced its most advanced photomask processing system, the MaskTrack Pro.
The system extends the technology of HamaTech?s successful MaskTrack System to Next Generation Lithography applications; 193i 22nm half pitch (hp), Extreme Ultraviolet Lithography (EUVL) and Nano-Imprint Lithography (NIL). Key to MaskTrack Pro is a cleaning technology that delivers unmatched particle removal down to 20nm while protecting 100% of the vulnerable mask structures and materials, according to the company.
"Without the mask the lithography process cannot begin and without a pristine, defect-free mask at the point-of-exposure the probability of yield loss on Next Generation Lithography processes is a fact" said Wilma Koolen-Hermkens, Chief Executive Officer of HamaTech APE "Mask Track Pro is the first system in the industry that can fully address zero particle and defect tolerance levels on the mask prior to exposure. We are encouraged by the positive response received from Semiconductor IDM's and OEM's that require the capabilities of the MaskTrack Pro to eliminate a key barrier of entry for new Lithography methods."
MaskTrack Pro combines innovative cleaning technology with sophisticated platform design for a mask integrity system ready to meet the production challenges of 193i 22nm hp DPT, EUVL and NIL. A unique combination of physical and chemical cleaning technologies enables the effective removal of organic and inorganic contamination without damage to the vulnerable features and material structures of the reticle. Focused Spot Cleaning TM, a feature for the precise removal of particles in defined areas of the mask, saves significant time after repair and eliminates the toughest overlay issues caused by backside contamination. The new MaskTrack Pro design allows clustering of metrology systems and pod-in-pod stocking for a holistic mask management approach throughout the life of the mask. MaskTrack Pro?s approach to mask integrity ensures that the mask is defect-free at exposure, offering a dramatic increase in tool productivity and uptime.
HamaTech will showcase the ne system at the Semicon West 2009 July 14-16th at the Moscone Center in San Francisco, California.