Sunday, June 24, 2018
Search
  
Submit your own News for
inclusion in our Site.
Click here...
Breaking News
FCC to Seek for Flexible Use of C-band and 6GHz Airwaves
AMD Presents Modular Routing Design for Chiplet-based Systems
Software Business Continues to Work For BlackBerry
Apple Turns to the U.S. Patent Office to Invalidate Qualcomm Patents
Samsung Patents Bezel-less, Notch-free Smartphone Design
China is Home to Most Smartphone Vendors
VidCon 2018: Youtube Announces Memberships, Merchandise as Alternatives to Ads
Chatting With Google Assistant Gets More Natural
Active Discussions
Which of these DVD media are the best, most durable?
How to back up a PS2 DL game
Copy a protected DVD?
roxio issues with xp pro
Help make DVDInfoPro better with dvdinfomantis!!!
menu making
Optiarc AD-7260S review
cdrw trouble
 Home > News > General Computing > Toshiba...
Last 7 Days News : SU MO TU WE TH FR SA All News

Wednesday, November 18, 2009
Toshiba Showcases The World's First Application in 20nm Generation Process technology


Toshiba has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, and proved its viability with the world's first 20nm-scale generation process technology.

This achievement will be announced at 22nd International Microprocesses and Nanotechnology Conference on November 19.

When semiconductors circuit patterns scale down into the 20nm-scale generation, current photoresists will no longer resolve circuit patterns precisely, resulting in roughness in pattern sidewalls. The biggest factor is that conventional photoresists consist of polymer compounds. While such compounds are easier to spin-cast on wafers, the size of their molecules and entangling of their molecular chains limit resolution. To overcome this, Toshiba has developed a photoresist with smaller molecular compounds.

Once a photoresist is exposed to light, it is removed from the substrate with a developer solution in one of two ways, positive tone and negative tone. In positive-tone development, the area exposed to the light source is removed from the wafer (i.e. that part of the photoresist becomes more soluble), leaving a channel. In negative-tone development, the area that has not been exposed to the light source is removed from the wafer (i.e, that part of the photoresist becomes more soluble), leaving a raised area. Application of both processes is essential for etching wafers.

Toshiba identified truxene, a material with a fine, durable structure, as a candidate material. The company has established the fundamental composition of a truxene derivative for photoresist, and demonstrated its use as a positive-tone photoresist in EUV generation. Moving beyond this, Toshiba has now demonstrated its application as a higher resolution negative-tone photoresist in 20nm-scale generation. Photoresists must be able to support both positive- and negative-tone processes in the lithography process, and Toshiba has how established basic technology for both.

Toshiba said it would further improve the performance of the molecular resist and apply it to the fabrication of 20nm-scale generation LSIs. According to the International Technology Roadmap for Semiconductors (ITRS), high volume production of this generation is expected to start in 2013.


Previous
Next
Samsung Introduces New Multimedia Player R0 in Korea        All News        PS3, Xbox 360, Integrate Facebook
Google and Bing Gain popularity Among Internet Users     General Computing News      Microsoft Launches Windows Azure Platform

Get RSS feed Easy Print E-Mail this Message

Related News
Toshiba Delivers RM5 vSAS Series SSDs Targeting SATA Applications
Value-Optimized Toshiba RC100 NVMe SSDs Now Available
Sharp to buy Toshiba's PC Business
Sharp close to Buying Toshiba's PC Business
Bain Capital to Support Toshiba Memory's Future Acquisitions
Toshiba Completes $18bn Sale of Flash Memory Unit
Toshiba Introduces New XS700 Series of Portable SSDs
Toshiba's Twin-Field Quantum Key Distribution Extends the Limit of Intercity Secure Communications
Toshiba Confirms Approval of $18 billion Chip Unit Sale by China
China Finally Approves Toshiba's Plan to Sell Its Memory Chip Unit: report
Toshiba Weighs Memory Chip Unit Options
Toshiba Releases New Surveillance, Video Streaming Laptop and Desktop Hard Drives

Most Popular News
 
Home | News | All News | Reviews | Articles | Guides | Download | Expert Area | Forum | Site Info
Site best viewed at 1024x768+ - CDRINFO.COM 1998-2018 - All rights reserved -
Privacy policy - Contact Us .