Sunday, November 23, 2014
Search
  
Submit your own News for
inclusion in our Site.
Click here...
Breaking News
Samsung Files ITC Complaint Against Nvidia
Europe To Ask Google Unlink Its Commercial And Search Services
Streaming TV Service Aereo Files for Bankruptcy
Square Launches Cash Register Service
Call of Duty: Advanced Warfare is the Biggest Entertainment Launch of 2014
Intel-Micron 3D NAND To Have 32 Layers, 256Gb Per Die
Intel To Release Chromecast-like Thumb-sized PCs
Google Contributor Lets You Pay And And See No Ads In Your Favorite Sites
Active Discussions
cdrw trouble
CDR for car Sat Nav
DVD/DL for Optiarc 7191S at 8X
Copied dvd's say blank in computer only
Made video, won't play back easily
New Features In Firefox 33
updated tests for dvd and cd burners
How to generate lots of different CDs quickly
 Home > News > General Computing > Toshiba...
Last 7 Days News : SU MO TU WE TH FR SA All News

Wednesday, November 18, 2009
Toshiba Showcases The World's First Application in 20nm Generation Process technology


Toshiba has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, and proved its viability with the world's first 20nm-scale generation process technology.

This achievement will be announced at 22nd International Microprocesses and Nanotechnology Conference on November 19.

When semiconductors circuit patterns scale down into the 20nm-scale generation, current photoresists will no longer resolve circuit patterns precisely, resulting in roughness in pattern sidewalls. The biggest factor is that conventional photoresists consist of polymer compounds. While such compounds are easier to spin-cast on wafers, the size of their molecules and entangling of their molecular chains limit resolution. To overcome this, Toshiba has developed a photoresist with smaller molecular compounds.

Once a photoresist is exposed to light, it is removed from the substrate with a developer solution in one of two ways, positive tone and negative tone. In positive-tone development, the area exposed to the light source is removed from the wafer (i.e. that part of the photoresist becomes more soluble), leaving a channel. In negative-tone development, the area that has not been exposed to the light source is removed from the wafer (i.e, that part of the photoresist becomes more soluble), leaving a raised area. Application of both processes is essential for etching wafers.

Toshiba identified truxene, a material with a fine, durable structure, as a candidate material. The company has established the fundamental composition of a truxene derivative for photoresist, and demonstrated its use as a positive-tone photoresist in EUV generation. Moving beyond this, Toshiba has now demonstrated its application as a higher resolution negative-tone photoresist in 20nm-scale generation. Photoresists must be able to support both positive- and negative-tone processes in the lithography process, and Toshiba has how established basic technology for both.

Toshiba said it would further improve the performance of the molecular resist and apply it to the fabrication of 20nm-scale generation LSIs. According to the International Technology Roadmap for Semiconductors (ITRS), high volume production of this generation is expected to start in 2013.


Previous
Next
Samsung Introduces New Multimedia Player R0 in Korea        All News        PS3, Xbox 360, Integrate Facebook
Google and Bing Gain popularity Among Internet Users     General Computing News      Microsoft Launches Windows Azure Platform

Get RSS feed Easy Print E-Mail this Message

Related News
Toshiba's Enterprise PC Solution Uses BIOS to Secure Information Security
Toshiba and Cisco To Collaborate In Internet of Things Solutions
Toshiba Expands Its Lineup of Application Processors for Wearable Devices
Toshiba Offers New 4TB and 5TB Desktop HDDs
Toshiba Debuts New 2-in-1 Convertible PC with a 360-Degree Design
Toshiba Develops Lifelike Communication Android, Smart Glasses
New Toshiba Tecra C50 Laptop Delivers Security at Affordable Price
Toshiba to Develop New Transistor Series Using Latest Process Technology
Toshiba to Restructure Its PC Business
Toshiba 2014 4K UHD Models Now Available
Toshiba and SanDisk Celebrate the Opening of the Second Phase of Fab 5 and Start Construction of New Fab 2 Semiconductor Fabrication Facility
Toshiba Achieves world's Highest Rate of Quantum Encryption Key Data Distribution

Most Popular News
 
Home | News | All News | Reviews | Articles | Guides | Download | Expert Area | Forum | Site Info
Site best viewed at 1024x768+ - CDRINFO.COM 1998-2014 - All rights reserved -
Privacy policy - Contact Us .