Sunday, September 25, 2016
Search
  
Submit your own News for
inclusion in our Site.
Click here...
Breaking News
Snapchat Introduces 'Spectacles' Camera-equipped Glasses, Changes Company name To Snap
Nvidia GPUs Could Return To Apple Macs
Lenovo Brings Fingerprint Authenticated Payments To Laptops
Report Cites Google, Salesforce Interest For Twitter
Dalian Wanda and Sony Enters Team Up in China Movie Business
Apple Develops Amazon Echo-Style Device
ALD Technology Chosen By Samsung, LG For Flexible OLEDs
TSMC To Use Different Processes And 3D Packages Across Future Design Platforms
Active Discussions
Which of these DVD media are the best, most durable?
How to back up a PS2 DL game
Copy a protected DVD?
roxio issues with xp pro
Help make DVDInfoPro better with dvdinfomantis!!!
menu making
Optiarc AD-7260S review
cdrw trouble
 Home > News > General Computing > Toshiba...
Last 7 Days News : SU MO TU WE TH FR SA All News

Wednesday, November 18, 2009
Toshiba Showcases The World's First Application in 20nm Generation Process technology


Toshiba has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, and proved its viability with the world's first 20nm-scale generation process technology.

This achievement will be announced at 22nd International Microprocesses and Nanotechnology Conference on November 19.

When semiconductors circuit patterns scale down into the 20nm-scale generation, current photoresists will no longer resolve circuit patterns precisely, resulting in roughness in pattern sidewalls. The biggest factor is that conventional photoresists consist of polymer compounds. While such compounds are easier to spin-cast on wafers, the size of their molecules and entangling of their molecular chains limit resolution. To overcome this, Toshiba has developed a photoresist with smaller molecular compounds.

Once a photoresist is exposed to light, it is removed from the substrate with a developer solution in one of two ways, positive tone and negative tone. In positive-tone development, the area exposed to the light source is removed from the wafer (i.e. that part of the photoresist becomes more soluble), leaving a channel. In negative-tone development, the area that has not been exposed to the light source is removed from the wafer (i.e, that part of the photoresist becomes more soluble), leaving a raised area. Application of both processes is essential for etching wafers.

Toshiba identified truxene, a material with a fine, durable structure, as a candidate material. The company has established the fundamental composition of a truxene derivative for photoresist, and demonstrated its use as a positive-tone photoresist in EUV generation. Moving beyond this, Toshiba has now demonstrated its application as a higher resolution negative-tone photoresist in 20nm-scale generation. Photoresists must be able to support both positive- and negative-tone processes in the lithography process, and Toshiba has how established basic technology for both.

Toshiba said it would further improve the performance of the molecular resist and apply it to the fabrication of 20nm-scale generation LSIs. According to the International Technology Roadmap for Semiconductors (ITRS), high volume production of this generation is expected to start in 2013.


Previous
Next
Samsung Introduces New Multimedia Player R0 in Korea        All News        PS3, Xbox 360, Integrate Facebook
Google and Bing Gain popularity Among Internet Users     General Computing News      Microsoft Launches Windows Azure Platform

Get RSS feed Easy Print E-Mail this Message

Related News
Toshiba Expands 24nm SLC Flash Family with 16Gb Offering
Toshiba Introduces the OCZ VX500 SATA SSD Series
Toshiba to Implement Eyefi Connected Features in Next FlashAir SD Cards
Toshiba Debuts Flashmatrix Technology
Toshiba Announces New BG SSDs with 3-Bit-Per-Cell TLC BiCS FLASH
Toshiba's ZD6000 Dual Port NVMe SSD Offers A Capacity Of 7.68TB
Toshiba PC Business Not Affected By Company's Restructuring
Toshiba Develops High-Speed MTJ Element for Non-Volatile STT-MRAM For 2X nm Generation Transistors
Toshiba Develops Circuit Technology for Small Area Non-volatile FPGAs
New Imaging Technique Can Simultaneously Acquire a Color Image and Depth Map from a Single Image Taken with a Monocular Camera
New Toshiba 8TB X300 Hard Disk Drive Released
Fujitsu, Vaio, Toshiba, Abandon PC Merger Plans

Most Popular News
 
Home | News | All News | Reviews | Articles | Guides | Download | Expert Area | Forum | Site Info
Site best viewed at 1024x768+ - CDRINFO.COM 1998-2016 - All rights reserved -
Privacy policy - Contact Us .