Tuesday, October 21, 2014
Search
  
Submit your own News for
inclusion in our Site.
Click here...
Breaking News
Google Play Music App To Follow Your Mood
Login To Google Using A USB Security Key
Toshiba Debuts New 2-in-1 Convertible PC with a 360-Degree Design
Acer Leads The Growing Chromebook Market
China Denies Apple's iCloud Hack Allegations
Samsung Galaxy KNOX Devices Approved for U.S. Government Classified Use
iPhone 6 Demand Help ARM's Growth
SK Hynix Develops High Density 16GB NVDIMM
Active Discussions
Copied dvd's say blank in computer only
How to generate lots of different CDs quickly
Yamaha CRW-F1UX
help questions structure DVDR
Made video, won't play back easily
Questions durability monitor LCD
Questions fungus CD/DVD Media, Some expert engineer in optical media can help me?
CD, DVD and Blu-ray burning for Android in development
 Home > News > PC Parts > Panason...
Last 7 Days News : SU MO TU WE TH FR SA All News

Thursday, October 09, 2008
Panasonic and Renesas to Collaborate on Development of SoCs at 32-nm Process Node


Building on their partnership<

The two companies are confident that their 32-nm node transistor technology and other advances can soon be applied to products in mass production.

It is anticipated that SoCs at the 32-nm node will deliver lower cost and improved performance enabled by miniaturization of their design rules, yet there are many technical issues that need to be solved. In particular, it is necessary to introduce new materials and develop new technologies to break through barriers to further integration, such as transistor gate leakage and inconsistent electrical characteristic problems, which are often found in existing technologies. Introducing new materials is technically difficult; however, the technology challenges in achieving acceptable transistor performance at the 32-nm node are more formidable than they were at previous-generation process nodes.

To meet these challenges, the new 32-nm SoC process employs a newly developed transistor technology with a metal/high-k1 gate stack structure and interconnect technology, using a new ultra-low-k2 material. To achieve a device using complementary metal-insulator semiconductor (CMIS)3 technology, a type of complementary Metal Oxide Semiconductor (CMOS), at a 32-nm node, an ultrathin film cap layer4 is applied at the atomic level to transistors with a metal/high-k gate stack structure under optimized conditions. This allows development of a conventional transistor configuration, employing an oxidized silicon film as the gate insulation layer. The introduction of the cap layer has been shown to improve transistor reliability in practical use and suppress distribution of electrical characteristics between transistors, thereby enabling the operation of large-scale circuits.

Panasonic and Reneasas have already jointly developed a 45-nm SoC process in 2007. The latest development on the new 32-nm fabrication process will be applied to SoCs for advanced mobile and digital home appliance products.


Previous
Next
LG Launches LG-KC780 Slim 8 Megapixel Portrait Phone        All News        AACS Specifications for China Blue High Definition Disc Available
Samsung Launches High-capacity Compact External Hard Drives     PC Parts News      Intel Could Probe AMD's Spin Off Plans

Get RSS feed Easy Print E-Mail this Message

Related News
Panasonic Develops 85-inch 4k Touch Screen, Showcases New HEVC LSI
Panasonic Commercializes Pin-Shaped Lithium Ion Battery For Wearables
Panasonic To Close DVD-player Factory In Slovakia
Panasonic and Leica Expand Partnership Agreement
Panasonic Reveals The Lumix DMC-LX100, Lumix DMC-GM5 Cameras And the DMC-CM1 Smartphone
Panasonic Showcases Optimized Workflow at IBC 2014
Panasonic Announces Rugged Toughpad FZ-E1 Tablet at IFA 2014
Panasonic Legendary Audio Brand Technics Returns
Panasonic and Tesla Sign Agreement for the Gigafactory
Panasonic Seeks To Sell Its Mobile Base Station Business to Nokia
Panasonic Updates Toughpad FZ-G1 10-inch Tablet
Intel To Manufacture Future Panasonic SoCs Using Intel's 14nm Low-Power Process

Most Popular News
 
Home | News | All News | Reviews | Articles | Guides | Download | Expert Area | Forum | Site Info
Site best viewed at 1024x768+ - CDRINFO.COM 1998-2014 - All rights reserved -
Privacy policy - Contact Us .